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Diamond Deposition
Chemical vapor deposition (CVD) technology enables growth of thin diamond coatings on a wide variety of substrate materials. Use of advanced hot-filament technology allows deposition of high-quality, polycrystalline diamond films from 5 to 50 microns thick. Costs are minimized through fast deposition cycle turnaround, large deposition area, low electrical power consumption, and safe, reliable operation.
This RAMAN spectrograph demonstrates the purity of the
diamond film produced by the Model 600 CVD Reactor

CVD Applications
The Model 600 is well suited to applying diamond coatings to tungsten carbide cutting inserts, endmills, drills, wear surfaces, and other carbide-based items. Diamond coated tools are used for machining abrasive non-metallic materials such as graphite, green ceramics, reinforced plastics, carbon composites, and abrasive non-ferrous metals such as silicon aluminum alloys.

In contrast to other diamond tooling techniques, such as PCD, diamond CVD coatings can be applied to cutting tools of virtually any configuration and size, including inserts with chipbreakers and other geometries.

While initially developed for coating carbide cutting tools, applications of the Model 600 have expanded to encompass:

  • semiconductor wafers in sizes up to 300mm
  • silicon substrates for thermal management
  • amorphous silicon deposition for solar cells and other products
  • titanium electrodes for water treatment and electrochemistry
  • passivation layers for semiconductor chucks
  • flat panel displays
  • windows for X-ray lithogaphy
  • slab diamond production

The Model 600 can be considered for any application requiring coating large or irregular surfaces with uniform diamond films.

Cutting tools—high throughput at low cost

The typical deposition area of the Model 600 is 12" x 12" (144 square inches or 93,000 square mm). A 1 micron per hour average growth rate and quick turnaround between runs, coupled with efficient use of power and gasses and the ability to run unattended for long periods, provides high throughput at low cost. For example, the Model 600 can coat more than 70,000 SPG-322 inserts per year.

Its economical operation and 30 kW power consumption enable the Model 600 to produce the lowest cost diamond coatings on the market.

The Model 600 offers options for planar deposition (far left) and three-dimensional deposition with round tool fixturing (left).

 

Semiconductor wafers
The broad deposition area of the Model 600 enables diamond coatings to be applied to wafers in all sizes up to 12 inches (300mm). Coatings are of high quality with a uniformity within ±10% over the entire wafer surface.

 

 

 

 



Titanium elecrodes
Diamond-coated electrodes are used for water treatment and electrochemistry.


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