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MICROWAVE PLASMA CVD SYSTEMS
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Model AX5000/AX5200

The AX5000 / AX5200 incorporate process development for the growth of high quality CVD diamond films for application in electronics, optics, thermal management, and tools. The AX5000 deposits CVD diamond on 2-in diameter substrates with good thickness uniformity. Substrates up to 4-in diameter can be accommodated.

 

Raman spectrum of a CVD
diamond films

SEM of a diamond film
   

Diamond membrane approximately 2 mm thick
(Membrane courtesy of Dr. H. Dishmann, BP America, Inc.)


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Microwave Plasma Applications

AX6300 1.5kW Microwave Plasma CVD System
The AX6300 1.5kW Microwave Plasma CVD System is a state of the art deposition tool for synthesizing high quality polycrystalline and single crystal diamond films for research and production.

Model AX6550/6560
AX6550 features high diamond deposition growth rate and is desiged for a production environment.

Model AX6600
AX6600 is a turnkey system designed for rapid, large area deposition.

AX5010 Microwave Plasma CVD Reactor
The AX5010 Microwave Plasma CVD Reactor is used for growth of high quality diamond films. Intended as a low cost system for basic film research in R&D laboratories.