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MICROWAVE PLASMA CVD SYSTEMS
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Model AX5250/AX5400

The AX5400/AX5250 incorporate process development for the growth of highest quality CVD diamond films at very high growth rates. Uniform, free standing diamond materials for advanced applications are obtained.

 

Raman spectrum of a CVD
diamond films

SEM of a thick diamond film
   
Examples of thick CVD diamond films
suitable for heat sink applications
(the larger wafer is 2 in. diameter)


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Microwave Plasma Applications

AX6300 1.5kW Microwave Plasma CVD System
The AX6300 1.5kW Microwave Plasma CVD System is a state of the art deposition tool for synthesizing high quality polycrystalline and single crystal diamond films for research and production.

Model AX6550/6560
AX6550 features high diamond deposition growth rate and is desiged for a production environment.

Model AX6600
AX6600 is a turnkey system designed for rapid, large area deposition.

AX5010 Microwave Plasma CVD Reactor
The AX5010 Microwave Plasma CVD Reactor is used for growth of high quality diamond films. Intended as a low cost system for basic film research in R&D laboratories.