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MICROWAVE PLASMA CVD SYSTEMS |
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| Overview | Microwave Plasma Reactors | Microwave Plasma Applications | Microwave Plasma Literature | Bibliography |
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Microwave Plasma Applications
Model AX6550/AX6560
 AX6550/AX6560 are the reactors in a series that incorporates former ASTeX newest development in microwave reactor technology. The AX6550/AX6560 enable the user sufficient production capacity to capture a significant market share in the rapidly expanding thermal management and the highly competitive tool markets.
| Figure 1 shows silicon wafer in a 4-inch diameter loading platform. The AX6550/AX6560 is designed to provide clear and easy access to substrates, making loading and unloading a simple operation.This design also allows the straightforward implementation of robotics for loading operations. |
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Figure 1. A 4-inch diameter silicon wafer on the AX 6550 substrate stage. |
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| Figure 2 shows an example of a loading configuration for SPG422 inserts over a 4 inch diameter loading area. |
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Figure 2. SPG422 inserts in standard tool fixture on AX 6560 substrate stage. |
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| The AX6500 Series of reactors is designed to satisfy customer needs in all application areas for thin and thick diamond films. Specialized reactors are available or under development for each application area, including thermal management, tool inserts, optics, and electronics. |
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Figure 3. Examples of thick diamond films suitable for thermal management applications, as well as CVD diamond-coated wafers and tool inserts. |
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| Microwave Plasma Applications
 AX6300 1.5kW Microwave Plasma CVD System
The AX6300 1.5kW Microwave Plasma CVD System is a state of the art deposition tool for synthesizing high quality polycrystalline and single crystal diamond films for research and production.
 Model AX6550/6560
AX6550 features high diamond deposition growth rate and is desiged for a production environment.
 Model AX6600
AX6600 is a turnkey system designed for rapid, large area deposition.
 AX5010 Microwave Plasma CVD Reactor
The AX5010 Microwave Plasma CVD Reactor is used for growth of high quality diamond films. Intended as a low cost system for basic film research in R&D laboratories.
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