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MICROWAVE PLASMA CVD SYSTEMS
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Model AX6600

The AX6600 is the latest model designed to meet the scale-up needs of large area coating of diamond.

 

 
Photograph showing the plasma and a typical batch of tool inserts during processing in the AX6600.   SEM photograph of an insert coated with CVD diamond in the AX6600 reactor. The thickness of the coating is approximately is micrometer.


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Microwave Plasma Applications

AX6300 1.5kW Microwave Plasma CVD System
The AX6300 1.5kW Microwave Plasma CVD System is a state of the art deposition tool for synthesizing high quality polycrystalline and single crystal diamond films for research and production.

Model AX6550/6560
AX6550 features high diamond deposition growth rate and is desiged for a production environment.

Model AX6600
AX6600 is a turnkey system designed for rapid, large area deposition.

AX5010 Microwave Plasma CVD Reactor
The AX5010 Microwave Plasma CVD Reactor is used for growth of high quality diamond films. Intended as a low cost system for basic film research in R&D laboratories.