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MICROWAVE PLASMA CVD SYSTEMS |
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| Overview | Microwave Plasma Reactors | Microwave Plasma Applications | Microwave Plasma Literature | Bibliography |
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Microwave Plasma Applications
Advanced Materials
Seki microwave plasma CVD systems are now routinely used to deposit aligned carbon nanotubes (Figure 1), nanocrystalline diamond (Figure 2), and silicon carbonitride materials (Figure 3).
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| Figure 1. SEM micrograph showing aligned carbon nanotubes grown by microwave plasma assisted CVD (Courtesy of L. C. Chen, National Taiwan University K. H. Chen, Academia Sinica) |
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| Figure 2. Example of micro and nano-crystalline diamond films grown in AX5000 (Courtesy of T. Soga, Nagoya Institute of Technology) |
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| Figure 3. Silicon carbonitride (SixCyNx) crystals and aligned nano rods formed using microwave plasma. (Courtesy of L. C. Chen, National Taiwan University K. H.Chen, Academia Sinica) |
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| Microwave Plasma Applications
 AX6300 1.5kW Microwave Plasma CVD System
The AX6300 1.5kW Microwave Plasma CVD System is a state of the art deposition tool for synthesizing high quality polycrystalline and single crystal diamond films for research and production.
 Model AX6550/6560
AX6550 features high diamond deposition growth rate and is desiged for a production environment.
 Model AX6600
AX6600 is a turnkey system designed for rapid, large area deposition.
 AX5010 Microwave Plasma CVD Reactor
The AX5010 Microwave Plasma CVD Reactor is used for growth of high quality diamond films. Intended as a low cost system for basic film research in R&D laboratories.
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