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microwave plasma reactors |
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| Overview | Microwave Plasma Reactors | Microwave Plasma Applications | Microwave Plasma Literature | Bibliography |
| Model AX5010 (1.5 kW)
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| Model AX5010 |
The Model 5010 diamond deposition source is used for the growth of high quality diamond film and other materials. Intended as a very low cost system for basic film research in universities, the system nevertheless produces true polycrystalline diamond films on a variety of substrates with properties equal to or better than those made by any other method. The AX5010 is easy to use, small in size, and gives reproducible results.
 The AX5010 reactor comes complete with a 1.5 kW microwave power generator, wave-guide components, quartz bell jar, and microwave cavity with pumping ports, substrate holder, support stand, and air cooling blower.
- Low cost reactor - for universities
- Field proven design - with extensive library of published papers in diamond
- Diamond applications include: homoepitaxy, doping studies, and selective growth
- Simple construction - reliable, easy to use andmaintain
- Gas handling and vacuum kits - for complete CVD diamond configuration
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| Microwave Plasma Products
 Model AX5000/5200 + AX6300 (ECR)
AX5000 includes reactor assembly, power supply, circulator, dummy load and three-stub tuner. AX5200 system combines reactor with vacuum control and process gas supply.
 Model AX5250/AX5400 (5 kW)
AX5250 reactor incorporates 5 kW at 2.45 GHz generator. AX5400 system combines reactor with vacuum control and process gas supply.
 Model AX6550/6560
AX6550 features high diamond deposition growth rate and is desiged for a production environment. AX6560 is a turnkey system, suited for robotic tool handling.
 Model AX6600
AX6600 is a turnkey system designed for rapid, large area deposition.
 Model AX5010
AX5010 is a low-cost 1.5 kW deposition source for basic film research.
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