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microwave plasma reactors
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Source Model AX5000 AX5400 — —
Integration Model AX5200 AX5250 — —
System Model AX6300 AX6350 AX6550/6560 AX6600
Reactor Type Plasma Immersion Plasma Immersion Plasma Immersion Plasma Immersion
Use R&D R&D Production Production
Year of Initial Sale 1988 1992 1993 1998
Stage Heated
or Cooled		 Heated Cooled Cooled Cooled
Microwave Power 1.5kW 5kW 8kW 60 - 100kW
Microwave Frequency 2.45GHz 2.45GHz 2.45GHz 915MHz
Typical Diameter 50mm 50mm 64mm dia. Thermal 200mm
      100mm dia. Tools  
Max Diameter 100mm 100mm 125mm 300mm
Typical Growth Rate 0.1-0.5micro meter g/hr up to 7micro meter m/hr up to 7micro meter m/hr up to 15micro meter m/hr
Typical Mass Rate 1-4mg/hr 60mg/hr 90mg/hr 1g/hr
Microwave Plasma Products

Model AX5000/5200 + AX6300 (ECR)
AX5000 includes reactor assembly, power supply, circulator, dummy load and three-stub tuner. AX5200 system combines reactor with vacuum control and process gas supply.

Model AX5250/AX5400 (5 kW)
AX5250 reactor incorporates 5 kW at 2.45 GHz generator. AX5400 system combines reactor with vacuum control and process gas supply.

Model AX6550/6560
AX6550 features high diamond deposition growth rate and is desiged for a production environment. AX6560 is a turnkey system, suited for robotic tool handling.

Model AX6600
AX6600 is a turnkey system designed for rapid, large area deposition.

Model AX5010
AX5010 is a low-cost 1.5 kW deposition source for basic film research.
Diamond Properties